The short version as to why we like the Gyeon Q²M Eccentric Finishing Pad a lot is as follows; it's very flexible and easy to use, works well with all types of water-based polishes, and delivers excellent results on all paint types. However, there are a couple of technical features underpinning this, which are worth saying a little more about. Firstly, the Gyeon Q²M Eccentric Finishing Pad features a low-profile cone-shaped design that eliminates pad drag and allows precise pressure distribution. In simple terms, this enhances the feel of the pad and also improves its efficiency, as the transfer of kinetic energy from the polisher to the work surface is optimised. Secondly, the Gyeon Q²M Eccentric Finishing Pad eschews complexity and features a flat unpatterned face, which prevents unspent product from being unwittingly stored and released with variable pressure inputs. In simple terms, this makes it quicker and easier to achieve full product break down (with diminishing polishes) and thus perfect mar-free results. For best results, we recommend using it in conjunction with either Gyeon Q² Primer or Gyeon Q²M Polish.
Cut Level1/10(Compared To Others)
Flexibility9/10(Compared To Others)
The Gyeon Q²M Eccentric Finishing Pad is manufactured using an ultra-high quality European foam engineered specifically for refining modern paint systems with water-based polishes and long-throw dual action polishers. As it is designed for refining duties on long-throw machines, this foam is non-reticulated and features a fine closed cell structure. This structure helps to prevent the polish from soaking into the pad, thus ensuring the bulk of it is held where it is needed most, i.e. between the surface of the pad and the panel being polished. This maximises the burnishing action of the polish and reduces product wastage. Regardless of your level of experience, you will find the Gyeon Q²M Eccentric Finishing Pad easy to use; its low-profile design performs predictably and consistently without distorting excessively under heavy loads, while its flexible nature ensures it conforms to curved surfaces with ease. The Gyeon Q²M Eccentric Finishing Pad also features a centering hole, a durable hook and loop backing specifically designed to be able to withstand the high lateral forces generated by long-throw dual action polishers, and a highly splayed side profile with a bevelled lower lip, which maximises access and safety when working in hard to reach spots. The Gyeon Q²M Eccentric Finishing Pad is currently available in two different sizes.
|Compatible Backing Plate||? 75 mm (90 mm)||? 125 mm (135 mm)|
|Construction||Flexible polyurethane foam|
|Foam Structure||Closed cell|
|Suitable For Hard Paints||Yes|
|Suitable For Intermediate Paints||Yes|
|Suitable For Soft Paints||Yes|
|Washable||Yes (hand only)|
How To Use
General usage notes: (i) always select the least aggressive pad you think you will need to achieve the desired result, and step up one grade at a time if more cut is required (ii) always ensure that you centre each pad properly on the backing plate (this can take several attempts to get right, but is vital if the machine is to remain perfectly balanced during use); (iii) always use an appropriate sized pad for the backing plate you are using (the pad should always protrude past the edge of the backing plate, never the other way around); (iv) always prime a new pad by loading it with 2-6 pea-sized drops of product (depending on pad size) and running it stationary on the paint for 30 seconds at low speed; (v) always ensure that spent polish residue on the face of the pad is brushed off regularly during use using a PB Utility Brush (failure to follow this advice can lead to micromarring of the finish, so don't be lazy!); (vi) after use, soak each pad in a bucket of PB Snappy Clean Boost solution for 15 minutes and then rinse under fresh running water (using your fingertips to massage out any remaining polish residue) and allow to dry naturally, and; (vii) while not in use, store in a dry, dust-free environment (lidded plastic storage boxes are ideal in this respect).